Controlled Environment by Durkee, John B.

By Durkee, John B.

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Covers all aspects of modern cleaning technologies, including environmental regulations. D. com PENCIL IT IN... org June 23-25, 2008 September 17-18, 2008 Technical Tutorial for Latchup/ ESD-Device Design and ESD-Test. E. High Solubility or Low Surface Tension — Take Your Pick This column is about compromise — why it’s chemically impossible to have the solvent you want. In critical cleaning, we want solvents with low surface tension, say less than 15 dynes/cm, so that the liquid can penetrate between particles and the surfaces they are contaminating.

These designations do not insure that this is pure enough for all critical cleaning applications; the water may still contain undesirable amounts of inorganics. USP PW and WFI are defined by Section <1231> of the United States Pharmacopeia (USP). To meet the concerns of chlorine and microbial contamination, PW must meet the EPA NPDWR and also Total Organic Carbon (TOC) and electrical conductivity specifications. The conductivity spec is lower than a single-pass RO but not as low as DI. WFI is the same as PW with an additional microbial endotoxin specification.

9 Plascore, Inc. 31 Terra Universal, Inc. 30 Vaisala, Inc. 13 Veltek Associates, Inc. , shares his technical expertise and explains this important element of successful contamination control. This essential working reference helps controlled environments professionals develop effective cleaning protocols and techniques. Order Your Copy Today! 95 (+shipping) May 2008 ‫ ܔ‬33 pp34:pp34 4/10/08 1:05 PM Page 34 CONTAMINATION CONTROL IN AND OUT OF THE CLEANROOM Are the Cleaning Agents Clean Enough? PART II: WATER BARBARA KANEGSBERG AND ED KANEGSBERG Water is the most common cleaning solvent for manufacturing processes.

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